According to CCTV news reports, on the evening of September 14th, Nature, a top international academic journal, published a major breakthrough made by Chinese scientists in the field of next-generation optoelectronic chip manufacturing. International E-Business News learned from CCTV News on the 15th that on the evening of September 14th, Nature, the top international academic journal, published a major breakthrough made by Chinese scientists in the field of next-generation optoelectronic chip manufacturing. According to the report, the research team led by Zhang Yong, Xiao Min and Zhu Shining of Nanjing University invented a new type of "non-reciprocal femtosecond laser polarization ferroelectric domain" technology, which focused the femtosecond pulse laser on the inside of the crystal of the material "lithium niobate". By controlling the direction of laser movement, an effective electric field was formed in the crystal to realize the direct writing and erasing of the three-dimensional structure. This new technology breaks through the light diffraction limit of the traditional femtosecond laser, and reduces the size of the three-dimensional structure of lithium niobate carved by light from the traditional 1 micron level (equivalent to one-fiftieth of the hair) to the nanometer level for the first time, reaching 30 nanometers, greatly improving the processing accuracy. This important invention may open up a new track for optoelectronic chip manufacturing in the future. It is expected to be used for the fabrication of key optoelectronic devices such as optoelectronic modulators, acoustic filters, nonvolatile ferroelectric memories, etc., and has a wide application prospect in the fields of 5G/6G communication, optical computing, artificial intelligence, etc.